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  • The Best Silicon Source Material for The Growth of Epitaxial Films in The CVD Process of Silicon Devices and Silicon Integrated Circuits Is Sih4 Gas
  • The Best Silicon Source Material for The Growth of Epitaxial Films in The CVD Process of Silicon Devices and Silicon Integrated Circuits Is Sih4 Gas
  • The Best Silicon Source Material for The Growth of Epitaxial Films in The CVD Process of Silicon Devices and Silicon Integrated Circuits Is Sih4 Gas
  • The Best Silicon Source Material for The Growth of Epitaxial Films in The CVD Process of Silicon Devices and Silicon Integrated Circuits Is Sih4 Gas
  • The Best Silicon Source Material for The Growth of Epitaxial Films in The CVD Process of Silicon Devices and Silicon Integrated Circuits Is Sih4 Gas
  • The Best Silicon Source Material for The Growth of Epitaxial Films in The CVD Process of Silicon Devices and Silicon Integrated Circuits Is Sih4 Gas
CAS No.: 7803-62-5
Formula: Sih4
EINECS: 232-263-4
Constituent: Industrial Pure Air
Grade Standard: Electronic Grade
Chemical Property: Semiconductor
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